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MCFF > MFF>Equipment> EVG Lithography

Equipment

EVG Lithography

Equipment Reservation Calendar

Reservation Instructions

EV620 Aligner Operational Manual
March 2006

1. Check the main power red button which should be on. If not, stop using the aligner and report to Bill.
2. Check the lamp which should be on. If not, stop using the aligner and report to Bill.
3. Write down necessary information in the log book.
4. Turn on the computer “power on” key. Then turn on the computer system
5. Adjust the pressure configuration
Standard pressure configuration parameters for Dr.Bergstrom’s group:
Contact/SDB pressure : 0.9 ~ 1.0
WEC : 0.3 ~ 0.5
EXP : 0.7 ~ 1.0
Chuck pressure < 0.285, typical value is 0.27
For other groups/applications, the pressure configuration may be different.
6. Run the EV620 software, login.
7. Wait till “Move tray out to continue” is shown at the left bottom corner of the screen. Then follow this instruction
8. Wait till the recipes are shown on the screen. Then select a recipe and modify the parameters:
Mask holder size/inch: 5 or 7
(Mask) Thickness: 2.30 (cm) for standard soda lime mask
Substrate size/inch: 4 or 6 or 2 ,etc.
(Substrate) Thickness: 0.50 (cm) for standard silicon wafer. 2.30 (cm) if a blank soda-lime/quartz mask plate is used as the substrate for mask duplication purpose. Other values for other substrates
Seperation/µm: Normally a value between 30 and 70 can be used.
Process: Top side or bottom side, etc.
Process mode: Transparent, etc.
Exposure mode: Continuous or Interval, etc.
Contact mode: Soft contact or hard contact, etc.
Exposure time: The time in seconds for the substrate to be exposed

If “Interval” is selected in “Exposure mode”, some other timing parameters also need to be set.

After filling all necessary parameters, hit the “run” button. When the “save” window pops up, select “No”.
9. Wait till “Insert mask holder and pressure <continue>” is shown at the left bottom corner of the screen. Then double check the mask holder to make sure it is the right size (5” or 7”). Change it if necessary. Also double check the substrate holder to make sure it is the right size (4” or 2” or 6”), change it if necessary. After these two steps, press the “continue” button.
10. Wait till “Insert mask with load frame and press <continue>” is shown at the left bottom corner of the screen. Then follow this instruction: Put the load frame down first, then the mask onto the load frame (If necessary, use a nitrogen gun to clean the mask before and after putting it on.) After that press the “continue” button.
11. Wait till “Move tray in” is shown at the left bottom corner of the screen. Then follow this instruction.
12. Wait till “Adjust mask” is shown at the left bottom corner of the screen. Then use the joystick to adjust the mask (in “scan stage” state) or to move the lenses (in “scan optic” state) if necessary. After finishing adjustment, press the “continue” button.
13. Wait till “Move tray out” is shown at the left bottom corner of the screen. Then follow this instruction.
14. Wait till “remove load frame and press <continue>” is shown at the left bottom corner of the screen. Then follow this instruction.
15. Wait till “Insert substrate and press <continue>” is shown at the left bottom corner of the screen. Then follow this instruction. After pressing the “continue” button, use a nitrogen gun to clean the substrate surface if necessary.
16. Wait till “Move tray in” is shown at the left bottom corner of the screen. Then follow this instruction.
17. Wait till “Adjust wafer” is shown at the left bottom corner of the screen. Then use the joystick to adjust the substrate (in “scan stage” state) or to move the lenses (in “scan optic” state) if necessary. After finishing adjustment, press the “continue” button.
18. Turn around and wait till exposure finishes and “Move tray out” is shown at the left bottom corner of the screen. Then follow this instruction.
19. Wait till “Remove substrate and press <continue> or <exit>” is shown at the left bottom corner of the screen. Then first remove the substrate. After that if more substrate to be exposed to the same mask, press the “continue” button. Otherwise press the “exit” button.
20. If selecting “exit” in last step, a window will pop up and show the following message: “Mask is loaded, do you want to unload the mask?”. Select “Yes”.
21. Wait till “Insert load frame and move tray in” is shown at the left bottom corner of the screen. Then follow this instruction.
22. Wait till “Move tray out” is shown at the left bottom corner of the screen. Then follow this instruction.
23. Wait till “End of process” is shown at the left bottom corner of the screen. Then remove the mask, then the load frame. After that press the “exit” button.
24. Select “park” from the main menu. After that a “move tray in” pop-up window is shown. Select “Yes”. Then move tray in.
25. Wait for 4 ~ 5 seconds then logout.
26. Close the EV620 software. Shut down the computer. Then put the computer “power on” key in “off” state.
27. Finish filling the rest information in the log book.


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Microfabrication Facility
Michigan Technological University

436 Minerals and Materials
Building
1400 Townsend Drive
Houghton, MI 49931-1295
906 369-2662(voice)
906 487-2949 (fax)
William Knudsen, Director
wknudsen@mtu.edu